Wednesday, July 27, 2016

19th International Conference on Molecular-Beam Epitaxy (MBE 2016)

The 19th International Conference on Molecular-Beam Epitaxy (MBE 2016) will take place in Montpellier, France, on September 4-9, 2016. This conference provides an international forum for new developments in fundamental and applied molecular beam epitaxy research.

Among the exhibitors will be k-Space Associates. The k-Space booth will feature a live demo of their metrology tools. Visitors can learn about their MBE metrology tools to measure parameters such as growth rate, temperature, curvature and stress in addition to analytical RHEED.

Program topics are: MBE fundamentals, III-V compounds, II-VI compounds, Group-IV semiconductors, Dilute Nitrides and Bismides, Wide Bandgap semiconductors, Oxide and Hybrid Epitaxial Systems, 2D materials (graphene, MoS2, WS2,...), Spintronics and Topological Materials, Nanostructures (QDs, nanowires,..), MBE grown Devices.